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Electrical Engineering book from C.H.I.P.S.

Photomask Fabrication Technology
by Benjamin G. Eynon, Jr.
and Banqiu Wu

Photomask Fabrication Technology details the science and technology of industrial photomask production, including fundamental principles, industrial production flows, technological evolution and development, and state of the art technologies.

Focusing on industrial applications rather than pure science, the goal of Photomask Fabrication Technology is to provide a comprehensive reference for any engineer developing microelectronic manufacturing processes

Contents:

  • Data Preparation and Design
  • Pattern Generation
  • Pattern Transfer
  • Photomask Metrology
  • Defect Control and Finishing
  • Inspection, Repair, and Cleaning
  • Resolution Enhancement Techniques
  • Water Fabrication Issues
  • Future Developments
Index

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Photomask Fabrication Technology
by Benjamin G. Eynon, Jr. and Banqiu Wu

2005 571 pages $124.00 + shipping
Texas residents please add 7 % sales tax

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