Characterization
of Semiconductor Materials: Principles
and Methods Volume 1

by Gary E. McGuire

This volume reviews the basic principles for a wide range of selected analytical techniques. It provides illustrative examples of applications taken from the semiconductor industry.

Characterization of Semiconductor Materials provides a unique resource for individuals working in this field.

Contents

1. Electrical Characterization of Semiconductor Materials and Devices
   • Introduction
   • Four-Point Probe/Wafer Mapping
   • Defects
   • Recombination/Generation Lifetime
   • Deep Level Transient Spectroscopy
   • Doping Profiling

2. Secondary Ion Mass Spectrometry
   • Principle of SIMS
   • Methodology
   • Mechanism of Secondary Ion Formation
   • Information Available
   • Instrumentation
   • Summary

3. Photoelectron Spectroscopy: Applications to Semiconductors
   • Introduction
   • The Electron Photoemission Experiment
   • Trends in Instrumentation
   • Profiling Structures

4. Ion/Solid Interactions in Surface Analysis
   • Introduction
   • Ion/Solid Interactions: Elemental Targets
   • Ion/Solid Interactions: Multielement Targets
   • Depth Profiling
   • Summary

5. Molecular Characterization of Dielectric Films by Laser Raman Spectroscopy
   • Introduction
   • Theory: Description of the Method
   • Interpretation of Raman Spectra of Solids
   • Raman Instrumentation and Measurement Capability
   • Applications to Thin Film Characterization
   • Limitations of Raman Spectroscopy for Thin Film Characterization
   • Advanced Raman Characterization Techniques

6. Characterization of Semiconductor Surfaces by Appearance Potential Spectroscopy
   • Introduction
   • Principle
   • Experimental
   • Applications
   • Conclusions
   • Glossary of Symbols

Index

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