Diamond Chemical Vapor Deposition presents an updated, systematic review of the latest developments in diamond CVD processes, with emphasis on the nucleation and early growth stages of diamond CVD.

Contents

General Introduction

Atomic and Crystal Structures of Diamond

Diamond CVD Techniques

• Hot-Filament CVD
• Plasma-Assisted CVD
• Flame CVD
• General Characteristics of Diamond CVD Processes

Diamond Nucleation Mechanisms

• Homogeneous Nucleation - Gas-Phase Nucleation
• Heterogeneous Nucleation - Surface Nucleation

Diamind Epitaxy, Oriented Growth, and Morphology Evolution

• Epitaxy
• Oriented and Textured Growth
• Morphology Evolution

Effects of Surface Conditions on Diamond Nucleation

• Substrate Materials
• Surface Pretreatment Methods and Nucleation Enhancement Mechanisms

Effects of Deposition Conditions on Diamond Nucleation

• Substrate Temperature
• Gas-Phase Activation
• Gas Pressure and Flow Rate
• Gas Composition
• Oxygen Addition

Theoretical and Modeling Studies on Diamond Nucleation

• Identification of Nucleation and Growth Mode
• Theoretical Studies on Nucleation Thermodynamics
• Theoretical Modeling of Nucleation Kinetics
• Clues of Structure, Chemistry, and Size of Diamond Nuclei

Index

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