Turn to this second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably.

Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications.

Features

• Practical approach in the handbook stresses CVD use in industry, such as semiconductors, optoelectronics, optics, cutting tools, refractory fibers, filters, and many others
• Coverage of the chemistry and deposition techniques of new materials produced by CVD as been greatly expanded in the book
• Special focus on the rapid growth of two major CVD processes: plasma CVD and metallo-organic CVD
• Emphasizes the broad expansion of the use of CVD processes in today's industry, showing the reasons for the growth and the different applications that have developed in the last few years

Contents

• Fundamentals of Chemical Vapor Deposition (CVD)
• The Chemistry of CVD
• Metallo-Organic CVD
• CVD Processes and Equipment
• The CVD of the Allotropes of Carbon
• The CVD of Non-Metallic Elements
• The CVD of Ceramic Materials: Carbides
• The CVD of Ceramic Materials: Nitrides
• The CVD of Ceramic Materials: Oxides
• Electronic Applications: Semiconductors
• Electronic Applications: Conductors, Insulators, and Diffusion Barriers
• Optoelectronic and Ferroelectric Applications
• Optical Applications
• Wear and Corrosion-Resistant Applications
• Cutting Tool Applications
• Fiber, Powder, and Monolithic Applications

Index

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