by Hwaiyu Geng
Written by 60 international experts, and peer reviewed by a seasoned advisory board, Semiconductor Manufacturing Handbook covers the fundamentals of relevant technology and its real-life application and operational considerations for planning, implementing, and controlling manufacturing processes.
Semiconductor Manufacturing Handbook includes hundreds of detailed illustrations and a list of relevant books, technical papers, and websites for further research.
This inclusive, wide-ranging coverage makes Semiconductor Manufacturing Handbook the most comprehensive single-volume reference ever published in the field.
Contents:
- How semiconductor chips are made
- IC design
- Silicon substrates for semiconductor manufacturing
- Copper, low-[kappa] dielectrics, and their reliability
- Fundamentals - silicide formation on Si
- Plasma process control
- Vacuum technology
- Photomask
- Microlithography
- Ion implantation and rapid thermal processing
- Wet etching
- Plasma etching
- Physical vapor deposition
- Chemical vapor deposition
- Epitaxy
- ECD fundamentals
- Chemical mechanical planarization
- Wet cleaning
- Inspection, measurement, and test
- Grinding, stress relief, and dicing
- Packaging
- Nanotechnology and nanomanufacturing
- Fundamentals of microelectromechanical system
- Flat-panel display technology and manufacturing
- Specialty gas and CDA systems
- Waste gas abatement systems
- PFC abatement
- Chemical and slurry handling systems
- Fluid handling components for high purity liquid chemicals and slurries
- Fundamentals of ultrapure water
- Yield management
- Automated material handling system
- CD metrology and CD-SEM
- Six Sigma
- Advanced process control
- Environmental, health, and safety considerations in semiconductor fabrication facilities
- Plan, design, and construction of a FAB
- Cleanroom design and construction
- Micro-vibration and noise design
- ESD controls in cleanroom environments
- Airborne molecular contamination
- Particle monitoring in semiconductor manufacturing
- Wastewater neutralization systems
Index